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Nanoimprinting Lithography is a next-generation lithography technology
that allows nano-sized patterns to be easily formed on various substrates without using a photolithography process.
HUNETPLUS has been developing nanoimprinting materials,
processes and equipment that can be applied to various industries.
Also HUNETPLUS is leading the way in commercialization based on technology
in the field of nanoimprinting lithography accumulated for many years.
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UHM(Ultra High-resolution Mask)TM is a next-generation mask capable
of ultra-high resolution (3,000 ppi)
for organic RGB material deposition of AR / VR display.
UHM(Ultra High-resolution Mask)TM was developed for the realization
of AR/VR display for the beginning of the Metaverse market.
UHMTM is a breakthrough next-generation mask manufacturing technology
that combines organic-inorganic hybrid material technology
and photolithography technology.
It is capable of realizing ultra-high resolution
for next-generation display processes such as AR / VR display.
FFM(Fine Film Mask)TM is a film type mask capable of high resolution (1,000 ppi)
and large-area deposition (6G~8G) used for
organic RGB material deposition of OLED display.
FFM(Fine Film Mask)TM was developed to overcome the limitations
of the resolution of FMM (Fine Metal Mask) of existing Invar materials.
UHMTM is a breakthrough next-generation mask manufacturing technology
that combines organic-inorganic hybrid materials
and large-area nano-imprinting technology.
It is capable of realizing high resolution
and cutting-edge technology capable of depositing on substrates up to 6G~8G in size.
ISS® (Imprinted Sapphire Substrate) was developed to replace
the patterned sapphire substrate (PSS)
used as a substrate for LEDs.
ISS® (Imprinted Sapphire Substrate) is a direct patterning substrate
based on nanoimprinting technology
without etching the sapphire substrate.
It is a breakthrough product
that can manufacture LED devices with higher efficiency and low cost.
Micro LED display refers to a display using a micro LED
that is 1/10 the size of a conventional LED.
Micro LED can achieve the same brightness with about half the energy
of conventional OLEDs,
and it is a display suitable for ultra-high resolution displays
because it can realize
red, green, and blue pixels with LED chips.
Micro LED requires a nano-sized patterned substrate rather than a conventional micro-sized pattern.
NISS® (Nano-Imprinted Sapphire Substrate) is a next-generation LED substrate
that can be applied to Nano LEDs as well as Micro LEDs
Since the solar cell is installed outside, there is a decrease in efficiency due to contamination such as various dust or bird waste.
Mothtye film of HUNETPLUS is a composite functional film with low reflection and self-cleaning effect implemented on PET film.
HUNETPLUS’ motheye film is a functional film that shows an efficiency improvement of up to 10% when attached to a solar cell module
The dense nano-structured eye of the moth can discern objects well even in the dark.
The Motheye structure can reduce reflection and transmit more light into the solar cell module,
thereby improving the efficiency of the solar cell
