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HUNETPLUS has been making efforts
to commercialize core materials for Semiconductors and Displays.


HUNETPLUS’ business is divided into a Printing Business Unit based
on NIL(Nanoimprinting Lithography) technology
and a Material Business Unit for core process materials for semiconductor and OLED displays.


We are doing our best to make the world's best products in this field,
and through this, we will contribute to humanity.


Materials Business Advanced Semiconductor & OLED Material
OLED Materials
  • Low temperature Over coat for OLED TSP application (LTOC80®)
  • TFT Planarization & VIA formation (PIXEL-T®)
  • OLED color R, G, B Blank formation (PLXEL-O®)
  • OLED Display Barrier Materials (EP200®)
  • OLED Display High Refractive Index Materials(HN1.7®)
  • OLED Display Flexible Substrates (FlexGlass®)
Semiconductor Materials
  • Photo-definable insulation material
  • Silicon Hardmask Material
  • ArF Photoresist
  • KrF Photoresist
  • BARC / TARC
Printing Business Advanced Printing & Imprinting Products
NIL(Nanolmprinting Lithography) Based Products
  • UFM® (Ultra Fine Mask for AR/VR Display)
    Ultra High-resolution mask for Metaverse Field
  • FFM® (Fine Film Mask for OLED)
    Film type evaporation mask for OLED
  • ISS® (imprinted Sapphire Substrate)
    High efficiency LED & MicroLED substrate
  • SOLARIAMAX®
    Low reflective file(or Glass) for enhancement of solarcell
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